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Fabrication of Periodic Nanostructures on Silicon Suboxide Films with Plasmonic Near-Field Ablation Induced by Low-Fluence Femtosecond Laser Pulses
Silicon suboxide (SiO(x), x ≈ 1) is a substoichiometric silicon oxide with a large refractive index and optical absorption coefficient that oxidizes to silica (SiO(2)) by annealing in air at ~1000 °C. We demonstrate that nanostructures with a groove period of 200–330 nm can be formed in air on a sil...
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| Publicado no: | Nanomaterials (Basel) |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7466530/ https://ncbi.nlm.nih.gov/pubmed/32751542 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10081495 |
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