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Atmospheric Pressure Plasma Deposition of TiO(2): A Review
Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO(2)) has a wide range of applications in electronics, solar cells, and photoca...
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| Publicado no: | Materials (Basel) |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7372480/ https://ncbi.nlm.nih.gov/pubmed/32629902 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma13132931 |
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