Generation of an X-ray nanobeam of a free-electron laser using reflective optics with speckle interferometry

Ultimate focusing of an X-ray free-electron laser (XFEL) enables the generation of ultrahigh-intensity X-ray pulses. Although sub-10 nm focusing has already been achieved using synchrotron light sources, the sub-10 nm focusing of XFEL beams remains difficult mainly because the insufficient stability...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:J Synchrotron Radiat
Hauptverfasser: Inoue, Takato, Matsuyama, Satoshi, Yamada, Jumpei, Nakamura, Nami, Osaka, Taito, Inoue, Ichiro, Inubushi, Yuichi, Tono, Kensuke, Yumoto, Hirokatsu, Koyama, Takahisa, Ohashi, Haruhiko, Yabashi, Makina, Ishikawa, Tetsuya, Yamauchi, Kazuto
Format: Artigo
Sprache:Inglês
Veröffentlicht: International Union of Crystallography 2020
Schlagworte:
Research Papers
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC7336172/
https://ncbi.nlm.nih.gov/pubmed/33565996
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1107/S1600577520006980
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!

Ähnliche Einträge