Mizuno, N., Camino, F., & Du, X. (2020). In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices. Nanomaterials (Basel).
Dyfyniad Arddull ChicagoMizuno, Naomi, Fernando Camino, and Xu Du. "In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography On the Electronic Transport of Suspended Graphene Devices." Nanomaterials (Basel) 2020.
Dyfyniad MLAMizuno, Naomi, Fernando Camino, and Xu Du. "In Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography On the Electronic Transport of Suspended Graphene Devices." Nanomaterials (Basel) 2020.
Rhybudd: Mae'n bosib nad yw'r dyfyniadau hyn bob amser yn 100% cywir.