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Chemical Lift-Off Lithography of Metal and Semiconductor Surfaces
Chemical lift-off lithography (CLL) is a subtractive soft-lithographic technique that uses polydimethylsiloxane (PDMS) stamps to pattern self-assembled monolayers of functional molecules for applications ranging from biomolecule patterning to transistor fabrication. A hallmark of CLL is preferential...
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| Publicado en: | ACS Mater Lett |
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| Main Authors: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
2019
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7220117/ https://ncbi.nlm.nih.gov/pubmed/32405626 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsmaterialslett.9b00438 |
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