Chemical Lift-Off Lithography of Metal and Semiconductor Surfaces

Chemical lift-off lithography (CLL) is a subtractive soft-lithographic technique that uses polydimethylsiloxane (PDMS) stamps to pattern self-assembled monolayers of functional molecules for applications ranging from biomolecule patterning to transistor fabrication. A hallmark of CLL is preferential...

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Udgivet i:ACS Mater Lett
Main Authors: Cheung, Kevin M., Stemer, Dominik M., Zhao, Chuanzhen, Young, Thomas D., Belling, Jason N., Andrews, Anne M., Weiss, Paul S.
Format: Artigo
Sprog:Inglês
Udgivet: 2019
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Article
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC7220117/
https://ncbi.nlm.nih.gov/pubmed/32405626
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsmaterialslett.9b00438
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