A carregar...

Laser-based Thickness Control in a Double-Side Polishing System for Silicon Wafers

Thickness control is a critical process of automated polishing of large and thin Si wafers in the semiconductor industry. In this paper, an elaborate double-side polishing (DSP) system is demonstrated, which has a polishing unit with feedback control of wafer thickness based on the scan data of a la...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:Sensors (Basel)
Main Authors: Zhu, Liang, Mei, Biao, Zhu, Weidong, Li, Wei
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7147602/
https://ncbi.nlm.nih.gov/pubmed/32183097
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s20061603
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!