Prucnal, S., Żuk, J., Hübner, R., Duan, J., Wang, M., Pyszniak, K., . . . Zhou, S. (2020). Electron Concentration Limit in Ge Doped by Ion Implantation and Flash Lamp Annealing. Materials (Basel).
Παραπομπή Chicago StylePrucnal, Slawomir, Jerzy Żuk, René Hübner, Juanmei Duan, Mao Wang, Krzysztof Pyszniak, Andrzej Drozdziel, Marcin Turek, και Shengqiang Zhou. "Electron Concentration Limit in Ge Doped By Ion Implantation and Flash Lamp Annealing." Materials (Basel) 2020.
Παραπομπή MLAPrucnal, Slawomir, et al. "Electron Concentration Limit in Ge Doped By Ion Implantation and Flash Lamp Annealing." Materials (Basel) 2020.
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