Coulon, P., Feng, P., Damilano, B., Vézian, S., Wang, T., & Shields, P. A. (2020). Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays. Sci Rep.
Citación estilo ChicagoCoulon, Pierre-Marie, Peng Feng, Benjamin Damilano, Stéphane Vézian, Tao Wang, and Philip A. Shields. "Influence of the Reactor Environment On the Selective Area Thermal Etching of GaN Nanohole Arrays." Sci Rep 2020.
Cita MLACoulon, Pierre-Marie, et al. "Influence of the Reactor Environment On the Selective Area Thermal Etching of GaN Nanohole Arrays." Sci Rep 2020.
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