Coulon, P., Feng, P., Damilano, B., Vézian, S., Wang, T., & Shields, P. A. (2020). Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays. Sci Rep.
Citação norma ChicagoCoulon, Pierre-Marie, Peng Feng, Benjamin Damilano, Stéphane Vézian, Tao Wang, and Philip A. Shields. "Influence of the Reactor Environment On the Selective Area Thermal Etching of GaN Nanohole Arrays." Sci Rep 2020.
ציטוט MLACoulon, Pierre-Marie, et al. "Influence of the Reactor Environment On the Selective Area Thermal Etching of GaN Nanohole Arrays." Sci Rep 2020.
אזהרה: ציטוטים אלה לעיתים לא מדויקים ב 100%.