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Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO(2)
Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO(2) substrates has been investigated. OTS is thermal...
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| Vydáno v: | Nanomaterials (Basel) |
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| Hlavní autoři: | , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
MDPI
2020
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7074835/ https://ncbi.nlm.nih.gov/pubmed/31991854 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10020210 |
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