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Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM

Block copolymer (BCP) self-assembly is a promising tool for next generation lithography as microphase separated polymer domains in thin films can act as templates for surface nanopatterning with sub-20 nm features. The replicated patterns can, however, only be as precise as their templates. Thus, th...

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Publicado en:Nanomaterials (Basel)
Autores principales: Bürger, Julius, Kunnathully, Vinay S., Kool, Daniel, Lindner, Jörg K. N., Brassat, Katharina
Formato: Artigo
Lenguaje:Inglês
Publicado: MDPI 2020
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Acceso en línea:https://ncbi.nlm.nih.gov/pmc/articles/PMC7022429/
https://ncbi.nlm.nih.gov/pubmed/31941037
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10010141
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