Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead...

Full description

Saved in:
Bibliographic Details
Published in:Nanomaterials (Basel)
Main Authors: Zhang, Cheng, Dyck, Ondrej, Garfinkel, David A., Stanford, Michael G., Belianinov, Alex A., Fowlkes, Jason D., Jesse, Stephen, Rack, Philip D.
Format: Artigo
Language:Inglês
Published: MDPI 2019
Subjects:
Article
Online Access:https://ncbi.nlm.nih.gov/pmc/articles/PMC6835536/
https://ncbi.nlm.nih.gov/pubmed/31574915
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano9101394
Tags: Add Tag
No Tags, Be the first to tag this record!

Similar Items