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Epoxy Resins for Negative Tone Photoresists
One of the types of negative tone photoresists is composed of at least a catalyst, a solvent, and epoxy resin. This is the primary raw material for lithography technology. To ensure high-quality pattern transfer in the lithography process, it is crucial to control the properties of the photoresist....
Gardado en:
| Publicado en: | Polymers (Basel) |
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| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
MDPI
2019
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6780111/ https://ncbi.nlm.nih.gov/pubmed/31500104 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/polym11091457 |
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