A carregar...
Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications
[Image: see text] Here, we propose a plasmon-induced redistribution of a thin polymer layer as a unique way for a residual layer-free lithographic approach. In particular, we demonstrate an ultrafast area-selective fabrication method using a low-intensity visible laser irradiation to direct the poly...
Na minha lista:
| Publicado no: | ACS Omega |
|---|---|
| Main Authors: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American Chemical Society
2019
|
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6648495/ https://ncbi.nlm.nih.gov/pubmed/31459713 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.8b03039 |
| Tags: |
Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!
|