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Atomic Layer Deposition of Al–W–Fluoride on LiCoO(2) Cathodes: Comparison of Particle- and Electrode-Level Coatings
[Image: see text] Atomic layer deposition (ALD) of the well-known Al(2)O(3) on a LiCoO(2) system is compared with that of a newly developed AlW(x)F(y) material. ALD coatings (∼1 nm thick) of both materials are shown to be effective in improving cycle life through mitigation of surface-induced capaci...
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| Publié dans: | ACS Omega |
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| Auteurs principaux: | , , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
American Chemical Society
2017
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| Accès en ligne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6641266/ https://ncbi.nlm.nih.gov/pubmed/31457686 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.7b00605 |
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