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Rupture-Disk Ampoule for Anhydrous Addition of Hydrogen Fluoride
The rapid increase in vapor pressure of liquid HF with temperature has been used in a rupture-disk-ampoule technique for mixing HF with materials under anhydrous conditions. At room temperature where HF has a vp near 1.4 atm, the disk with a rupture limit near 10 atm confines the acid. At higher tem...
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| Publicado no: | J Res Natl Bur Stand A Phys Chem |
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| Autor principal: | |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
National Institute of Standards and Technology
1966
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6640567/ https://ncbi.nlm.nih.gov/pubmed/31823983 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.070A.010 |
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