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Scalable fabrication of microneedle arrays via spatially controlled UV exposure

This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create micr...

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Detalhes bibliográficos
Publicado no:Microsyst Nanoeng
Main Authors: Takahashi, Hidetoshi, Jung Heo, Yun, Arakawa, Nobuchika, Kan, Tesuo, Matsumoto, Kiyoshi, Kawano, Ryuji, Shimoyama, Isao
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2016
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6444715/
https://ncbi.nlm.nih.gov/pubmed/31057837
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/micronano.2016.49
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