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Scalable fabrication of microneedle arrays via spatially controlled UV exposure
This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create micr...
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| Publicado no: | Microsyst Nanoeng |
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| Main Authors: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6444715/ https://ncbi.nlm.nih.gov/pubmed/31057837 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/micronano.2016.49 |
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