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Scalable Manufacturing of Single Nanowire Devices Using Crack-Defined Shadow Mask Lithography
[Image: see text] Single nanowires (NWs) have a broad range of applications in nanoelectronics, nanomechanics, and nanophotonics, but, to date, no technique can produce single sub-20 nm wide NWs with electrical connections in a scalable fashion. In this work, we combine conventional optical and crac...
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| Publicado no: | ACS Appl Mater Interfaces |
|---|---|
| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American
Chemical Society
2019
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| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6426283/ https://ncbi.nlm.nih.gov/pubmed/30698940 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsami.8b19410 |
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