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Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices
The large-scale production of high-quality and clean graphene devices, aiming at technological applications, has been a great challenge over the last decade. This is due to the high affinity of graphene with polymers that are usually applied in standard lithography processes and that, inevitably, mo...
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| Publicado no: | Beilstein J Nanotechnol |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Beilstein-Institut
2019
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6369997/ https://ncbi.nlm.nih.gov/pubmed/30800574 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.10.34 |
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