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Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective Si...

詳細記述

保存先:
書誌詳細
出版年:Micromachines (Basel)
主要な著者: Ou, Yiyu, Fadil, Ahmed, Ou, Haiyan
フォーマット: Artigo
言語:Inglês
出版事項: MDPI 2016
主題:
オンライン・アクセス:https://ncbi.nlm.nih.gov/pmc/articles/PMC6190085/
https://ncbi.nlm.nih.gov/pubmed/30404323
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi7090152
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