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Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning
An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective Si...
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| 出版年: | Micromachines (Basel) |
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| 主要な著者: | , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
MDPI
2016
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| 主題: | |
| オンライン・アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6190085/ https://ncbi.nlm.nih.gov/pubmed/30404323 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi7090152 |
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