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Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review
The rapid development of nanotechnologies and sciences has led to the great demand for novel lithography methods allowing large area, low cost and high resolution nano fabrications. Characterized by unique sub-diffraction optical features like propagation with an ultra-short wavelength and great fie...
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| Publicado no: | Micromachines (Basel) |
|---|---|
| Main Authors: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6189824/ https://ncbi.nlm.nih.gov/pubmed/30404291 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi7070118 |
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