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Surface Modification of Electroosmotic Silicon Microchannel Using Thermal Dry Oxidation
A simple fabrication method for the surface modification of an electroosmotic silicon microchannel using thermal dry oxidation is presented. The surface modification is done by coating the silicon surface with a silicon dioxide (SiO(2)) layer using a thermal oxidation process. The process aims not o...
Shranjeno v:
| izdano v: | Micromachines (Basel) |
|---|---|
| Main Authors: | , , , , , |
| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
MDPI
2018
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| Teme: | |
| Online dostop: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6187731/ https://ncbi.nlm.nih.gov/pubmed/30424155 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi9050222 |
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