Achal, R., Rashidi, M., Croshaw, J., Churchill, D., Taucer, M., Huff, T., . . . Wolkow, R. A. (2018). Lithography for robust and editable atomic-scale silicon devices and memories. Nat Commun.
Styl ChicagoAchal, Roshan, Mohammad Rashidi, Jeremiah Croshaw, David Churchill, Marco Taucer, Taleana Huff, Martin Cloutier, Jason Pitters, a Robert A. Wolkow. "Lithography for Robust and Editable Atomic-scale Silicon Devices and Memories." Nat Commun 2018.
Citace podle MLAAchal, Roshan, et al. "Lithography for Robust and Editable Atomic-scale Silicon Devices and Memories." Nat Commun 2018.
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