Fan, C., Tseng, F., & Tseng, C. (2018). Electrical Performance and Reliability Improvement of Amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors with HfO(2) Gate Dielectrics by CF(4) Plasma Treatment. Materials (Basel).
Chicago Style CitationFan, Ching-Lin, Fan-Ping Tseng, and Chiao-Yuan Tseng. "Electrical Performance and Reliability Improvement of Amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors With HfO(2) Gate Dielectrics By CF(4) Plasma Treatment." Materials (Basel) 2018.
MLA CitationFan, Ching-Lin, Fan-Ping Tseng, and Chiao-Yuan Tseng. "Electrical Performance and Reliability Improvement of Amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors With HfO(2) Gate Dielectrics By CF(4) Plasma Treatment." Materials (Basel) 2018.