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Understanding the effect of wet etching on damage resistance of surface scratches
Fused silica optics often exhibit surface scratches after polishing that radically reduce their damage resistance at the wavelength of 351 nm in the nanosecond regime. Consequently, chemical treatments after polishing are often used to increase the damage threshold and ensure a safe operation of the...
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| Publicado no: | Sci Rep |
|---|---|
| Main Authors: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group UK
2018
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5778008/ https://ncbi.nlm.nih.gov/pubmed/29358625 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-018-19716-0 |
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