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Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectivel...
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| Publicado no: | AMB Express |
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| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer Berlin Heidelberg
2017
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5686038/ https://ncbi.nlm.nih.gov/pubmed/29138995 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s13568-017-0504-0 |
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