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The influence of structural disorder and phonon on metal-to-insulator transition of VO(2)

We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the therma...

Deskribapen osoa

Gorde:
Xehetasun bibliografikoak
Argitaratua izan da:Sci Rep
Egile Nagusiak: Hwang, In-Hui, Jin, Zhenlan, Park, Chang-In, Han, Sang-Wook
Formatua: Artigo
Hizkuntza:Inglês
Argitaratua: Nature Publishing Group UK 2017
Gaiak:
Sarrera elektronikoa:https://ncbi.nlm.nih.gov/pmc/articles/PMC5666023/
https://ncbi.nlm.nih.gov/pubmed/29093503
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-017-14235-w
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