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Ultra-Broadband, Lithography-Free, and Large-Scale Compatible Perfect Absorbers: The Optimum Choice of Metal layers in Metal-Insulator Multilayer Stacks
We report ultra-broadband perfect absorbers for visible and near-infrared applications that are based on multilayers of metal-insulator (MI) stacks fabricated employing straightforward layer deposition techniques and are, therefore, lithography-free and large-scale compatible. We scrutinize the impa...
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| Publicat a: | Sci Rep |
|---|---|
| Autors principals: | , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Nature Publishing Group UK
2017
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5665894/ https://ncbi.nlm.nih.gov/pubmed/29093519 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-017-13837-8 |
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