APA aipamena

Werrell, J. M., Mandal, S., Thomas, E. L. H., Brousseau, E. B., Lewis, R., Borri, P., . . . Williams, O. A. (2017). Effect of slurry composition on the chemical mechanical polishing of thin diamond films. Sci Technol Adv Mater.

Chicago Style aipamena

Werrell, Jessica M., Soumen Mandal, Evan L. H. Thomas, Emmanuel B. Brousseau, Ryan Lewis, Paola Borri, Philip R. Davies, and Oliver A. Williams. "Effect of Slurry Composition On the Chemical Mechanical Polishing of Thin Diamond Films." Sci Technol Adv Mater 2017.

MLA aipamena

Werrell, Jessica M., et al. "Effect of Slurry Composition On the Chemical Mechanical Polishing of Thin Diamond Films." Sci Technol Adv Mater 2017.

Kontuz: berrikusi erreferentzia hauek erabili aurretik.