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Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the...
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| Publicado no: | Beilstein J Nanotechnol |
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| Main Authors: | , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Beilstein-Institut
2017
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5629386/ https://ncbi.nlm.nih.gov/pubmed/29046845 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.8.198 |
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