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Selective-area growth of single-crystal wurtzite GaN nanorods on SiO(x)/Si(001) substrates by reactive magnetron sputter epitaxy exhibiting single-mode lasing
Selective-area growth (SAG) of single-crystal wurtzite GaN nanorods (NRs) directly onto Si(001) substrates with un-etched native SiO(x) amorphous layer, assisted by a patterning TiN(x) mask fabricated by nanosphere lithography (NSL), has been realized by reactive magnetron sputter epitaxy (MSE). The...
שמור ב:
| הוצא לאור ב: | Sci Rep |
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| Main Authors: | , , , , , , , , , , |
| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
Nature Publishing Group UK
2017
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| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5629253/ https://ncbi.nlm.nih.gov/pubmed/28983102 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-017-12702-y |
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