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Investigations of Phase Transformation in Monocrystalline Silicon at Low Temperatures via Nanoindentation
Nanoindentations of monocrystalline silicon are conducted to investigate the phase transformation process at a temperature range from 292 K to 210 K. The load-displacement curves are obtained and the residual indents are detected by Raman spectra. MD simulations are also conducted to identify the ph...
Wedi'i Gadw mewn:
| Cyhoeddwyd yn: | Sci Rep |
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| Prif Awduron: | , , , , , , , |
| Fformat: | Artigo |
| Iaith: | Inglês |
| Cyhoeddwyd: |
Nature Publishing Group UK
2017
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| Pynciau: | |
| Mynediad Ar-lein: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5561054/ https://ncbi.nlm.nih.gov/pubmed/28819254 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-017-09411-x |
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