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Patterning microfluidic device wettability with spatially-controlled plasma oxidation

Microfluidic devices can form double emulsions with uniform properties, but require cumbersome fabrication steps to pattern their wettability. We demonstrate spatially-controlled plasma oxidation to create wettability patterns for forming double emulsions. Our method performs comparably to chemical...

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Foilsithe in:Lab Chip
Main Authors: Kim, Samuel C., Sukovich, David J., Abate, Adam R.
Formáid: Artigo
Teanga:Inglês
Foilsithe: 2015
Ábhair:
Rochtain Ar Líne:https://ncbi.nlm.nih.gov/pmc/articles/PMC5531047/
https://ncbi.nlm.nih.gov/pubmed/26105774
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1039/c5lc00626k
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