A carregar...
Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications
New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba(0.96)Ca(0.04)Ti(0.82)Zr(0.18)O(3) (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (...
Na minha lista:
| Publicado no: | Materials (Basel) |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2012
|
| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5448959/ https://ncbi.nlm.nih.gov/pubmed/28816997 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma5040575 |
| Tags: |
Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!
|