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Nanohardness and Residual Stress in TiN Coatings
TiN films were prepared by the Cathodic arc evaporation deposition method under different negative substrate bias. AFM image analyses show that the growth mode of biased coatings changes from 3D island to lateral when the negative bias potential is increased. Nanohardness of the thin films was measu...
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| Publicado no: | Materials (Basel) |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2011
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5448585/ https://ncbi.nlm.nih.gov/pubmed/28879958 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma4050929 |
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