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Atomic layer etching of graphene through controlled ion beam for graphene-based electronics
The electronic and optical properties of graphene are greatly dependent on the the number of layers. For the precise control of the graphene layers, atomic layer etching (ALE), a cyclic etching method achieved through chemical adsorption and physical desorption, can be the most powerful technique du...
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| Udgivet i: | Sci Rep |
|---|---|
| Main Authors: | , , , , , , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Nature Publishing Group UK
2017
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| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5446397/ https://ncbi.nlm.nih.gov/pubmed/28550291 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-017-02430-8 |
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