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Thin Film Deposition Using Energetic Ions
One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assi...
Guardat en:
| Publicat a: | Materials (Basel) |
|---|---|
| Autors principals: | , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI
2010
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5445827/ https://ncbi.nlm.nih.gov/pubmed/28883323 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma3084109 |
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