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Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study

This work describes various combinations of cleaning methods involved in the preparation of Ni-5% W substrates for the deposition of buffer layers using water-based solvents. The substrate has been studied for its surface properties using X-ray photoelectron spectroscopy (XPS). The contaminants in t...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Narayanan, Vyshnavi, Bruneel, Els, Hühne, Ruben, van Driessche, Isabel
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2012
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5304587/
https://ncbi.nlm.nih.gov/pubmed/28348306
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano2030251
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