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Pushing the limits of crystallography
A very serious concern of scientists dealing with crystal structure refinement, including theoretical research, pertains to the characteristic bias in calculated versus measured diffraction intensities, observed particularly in the weak reflection regime. This bias is here attributed to corrective f...
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| Publicado no: | J Appl Crystallogr |
|---|---|
| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
International Union of Crystallography
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5139996/ https://ncbi.nlm.nih.gov/pubmed/27980514 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1107/S160057671601637X |
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