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All-gas-phase synthesis of UiO-66 through modulated atomic layer deposition

Thin films of stable metal-organic frameworks (MOFs) such as UiO-66 have enormous application potential, for instance in microelectronics. However, all-gas-phase deposition techniques are currently not available for such MOFs. We here report on thin-film deposition of the thermally and chemically st...

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Detalhes bibliográficos
Publicado no:Nat Commun
Main Authors: Lausund, Kristian Blindheim, Nilsen, Ola
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2016
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5123030/
https://ncbi.nlm.nih.gov/pubmed/27876797
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/ncomms13578
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