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Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and conformality by taking advantage of self-limiting reactions between vapor-phase precursors and the growing film. Perovskite oxides present potent...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Veröffentlicht in:J Vis Exp
Hauptverfasser: Lin, Edward L., Edmondson, Bryce I., Hu, Shen, Ekerdt, John G.
Format: Artigo
Sprache:Inglês
Veröffentlicht: MyJove Corporation 2016
Schlagworte:
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC5091695/
https://ncbi.nlm.nih.gov/pubmed/27501462
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3791/54268
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