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Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition
Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and conformality by taking advantage of self-limiting reactions between vapor-phase precursors and the growing film. Perovskite oxides present potent...
Enregistré dans:
| Publié dans: | J Vis Exp |
|---|---|
| Auteurs principaux: | , , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
MyJove Corporation
2016
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| Sujets: | |
| Accès en ligne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5091695/ https://ncbi.nlm.nih.gov/pubmed/27501462 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3791/54268 |
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