APA引文

Miao, H., Chen, L., Mirzaeimoghri, M., Kasica, R., & Wen, H. (2016). Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings. J Microelectromech Syst.

Citação norma Chicago

Miao, Houxun, Lei Chen, Mona Mirzaeimoghri, Richard Kasica, and Han Wen. "Cryogenic Etching of High Aspect Ratio 400 Nm Pitch Silicon Gratings." J Microelectromech Syst 2016.

MLA引文

Miao, Houxun, et al. "Cryogenic Etching of High Aspect Ratio 400 Nm Pitch Silicon Gratings." J Microelectromech Syst 2016.