Miao, H., Chen, L., Mirzaeimoghri, M., Kasica, R., & Wen, H. (2016). Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings. J Microelectromech Syst.
Chicago-стиль цитированияMiao, Houxun, Lei Chen, Mona Mirzaeimoghri, Richard Kasica, and Han Wen. "Cryogenic Etching of High Aspect Ratio 400 Nm Pitch Silicon Gratings." J Microelectromech Syst 2016.
MLA-цитированиеMiao, Houxun, et al. "Cryogenic Etching of High Aspect Ratio 400 Nm Pitch Silicon Gratings." J Microelectromech Syst 2016.
Предупреждение: эти цитированмия не могут быть всегда правильны на 100%.