Yusoh, S. N., & Yaacob, K. A. (2016). Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography. Beilstein J Nanotechnol.
Styl ChicagoYusoh, Siti Noorhaniah, a Khatijah Aisha Yaacob. "Effect of Tetramethylammonium Hydroxide/isopropyl Alcohol Wet Etching On Geometry and Surface Roughness of Silicon Nanowires Fabricated By AFM Lithography." Beilstein J Nanotechnol 2016.
Citace podle MLAYusoh, Siti Noorhaniah, a Khatijah Aisha Yaacob. "Effect of Tetramethylammonium Hydroxide/isopropyl Alcohol Wet Etching On Geometry and Surface Roughness of Silicon Nanowires Fabricated By AFM Lithography." Beilstein J Nanotechnol 2016.
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