Atomic Layer Deposition for Coating of High Aspect Ratio TiO(2) Nanotube Layers

[Image: see text] We present an optimized approach for the deposition of Al(2)O(3) (as a model secondary material) coating into high aspect ratio (≈180) anodic TiO(2) nanotube layers using the atomic layer deposition (ALD) process. In order to study the influence of the diffusion of the Al(2)O(3) pr...

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Detalhes bibliográficos
Publicado no:Langmuir
Main Authors: Zazpe, Raul, Knaut, Martin, Sopha, Hanna, Hromadko, Ludek, Albert, Matthias, Prikryl, Jan, Gärtnerová, V., Bartha, Johann W., Macak, Jan M.
Formato: Artigo
Idioma:Inglês
Publicado em: American Chemical Society 2016
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5072108/
https://ncbi.nlm.nih.gov/pubmed/27643411
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.langmuir.6b03119
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