Atomic Layer Deposition for Coating of High Aspect Ratio TiO(2) Nanotube Layers

[Image: see text] We present an optimized approach for the deposition of Al(2)O(3) (as a model secondary material) coating into high aspect ratio (≈180) anodic TiO(2) nanotube layers using the atomic layer deposition (ALD) process. In order to study the influence of the diffusion of the Al(2)O(3) pr...

Descripción completa

Guardado en:
Detalles Bibliográficos
Publicado en:Langmuir
Autores principales: Zazpe, Raul, Knaut, Martin, Sopha, Hanna, Hromadko, Ludek, Albert, Matthias, Prikryl, Jan, Gärtnerová, V., Bartha, Johann W., Macak, Jan M.
Formato: Artigo
Lenguaje:Inglês
Publicado: American Chemical Society 2016
Acceso en línea:https://ncbi.nlm.nih.gov/pmc/articles/PMC5072108/
https://ncbi.nlm.nih.gov/pubmed/27643411
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.langmuir.6b03119
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Ejemplares similares