Chemical Vapor Deposition of High‐Quality Large‐Sized MoS(2) Crystals on Silicon Dioxide Substrates

Large‐sized MoS(2) crystals can be grown on SiO(2)/Si substrates via a two‐stage chemical vapor deposition method. The maximum size of MoS(2) crystals can be up to about 305 μm. The growth method can be used to grow other transition metal dichalcogenide crystals and lateral heterojunctions. The elec...

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Detalhes bibliográficos
Publicado no:Adv Sci (Weinh)
Main Authors: Chen, Jianyi, Tang, Wei, Tian, Bingbing, Liu, Bo, Zhao, Xiaoxu, Liu, Yanpeng, Ren, Tianhua, Liu, Wei, Geng, Dechao, Jeong, Hu Young, Shin, Hyeon Suk, Zhou, Wu, Loh, Kian Ping
Formato: Artigo
Idioma:Inglês
Publicado em: John Wiley and Sons Inc. 2016
Assuntos:
Communications
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5071677/
https://ncbi.nlm.nih.gov/pubmed/27818906
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/advs.201600033
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