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Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns
Directed self-assembly of block copolymers is a scalable method to fabricate well-ordered patterns over the wafer scale with feature sizes below the resolution of conventional lithography. Typically, lithographically-defined prepatterns with varying chemical contrast are used to rationally guide the...
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| Publicado no: | Sci Rep |
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| Main Authors: | , , , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4985650/ https://ncbi.nlm.nih.gov/pubmed/27528258 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep31407 |
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