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Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength
Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach fo...
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| 出版年: | Sci Rep |
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| 主要な著者: | , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Nature Publishing Group
2016
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4977501/ https://ncbi.nlm.nih.gov/pubmed/27501749 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep31301 |
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