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Selective directed self-assembly of coexisting morphologies using block copolymer blends

Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. Here we expand on traditional DSA chemical patterning. A blend of lamellar- and cylinder-forming block copolymers assembles...

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Publicat a:Nat Commun
Autors principals: Stein, A., Wright, G., Yager, K. G., Doerk, G. S., Black, C. T.
Format: Artigo
Idioma:Inglês
Publicat: Nature Publishing Group 2016
Matèries:
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4974660/
https://ncbi.nlm.nih.gov/pubmed/27480327
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/ncomms12366
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