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Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics
The laser damage precursors in subsurface of fused silica (e.g. photosensitive impurities, scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-frequency ultrasonic agitation, respectively. The comparison of scratches morphology after static e...
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| Publicado no: | Sci Rep |
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| Main Authors: | , , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4971457/ https://ncbi.nlm.nih.gov/pubmed/27484188 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep31111 |
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