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Spatially Multiplexed Micro-Spectrophotometry in Bright Field Mode for Thin Film Characterization
Thickness characterization of thin films is of primary importance in a variety of nanotechnology applications, either in the semiconductor industry, quality control in nanofabrication processes or engineering of nanoelectromechanical systems (NEMS) because small thickness variability can strongly co...
Gardado en:
| Publicado en: | Sensors (Basel) |
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| Main Authors: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
MDPI
2016
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4934351/ https://ncbi.nlm.nih.gov/pubmed/27338398 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s16060926 |
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