Wird geladen...
Characteristics and Mechanism of Cu Films Fabricated at Room Temperature by Aerosol Deposition
We were successful in growing a dense Cu film on Al(2)O(3) substrates at room temperature using an aerosol deposition (AD) method. The characteristics of Cu films were investigated through electrical resistivity and X-ray photoelectron spectroscopy (XPS). The resistivity of Cu films was low (9.2–12....
Gespeichert in:
| Veröffentlicht in: | Nanoscale Res Lett |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Springer US
2016
|
| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4805680/ https://ncbi.nlm.nih.gov/pubmed/27009529 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1378-9 |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|