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Characteristics and Mechanism of Cu Films Fabricated at Room Temperature by Aerosol Deposition
We were successful in growing a dense Cu film on Al(2)O(3) substrates at room temperature using an aerosol deposition (AD) method. The characteristics of Cu films were investigated through electrical resistivity and X-ray photoelectron spectroscopy (XPS). The resistivity of Cu films was low (9.2–12....
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| 發表在: | Nanoscale Res Lett |
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| Main Authors: | , , , , |
| 格式: | Artigo |
| 語言: | Inglês |
| 出版: |
Springer US
2016
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| 主題: | |
| 在線閱讀: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4805680/ https://ncbi.nlm.nih.gov/pubmed/27009529 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1378-9 |
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